The field of science and technology has been transformed by the development of lasers in the deep ultraviolet (DUV) spectrum. Researchers at the Chinese Academy of Sciences have now achieved the highest power output for 193 and 221 nm lasers using a lithium tri borate (LBO) crystal. This breakthrough opens up new possibilities for utilizing this laser in DUV applications, which are widely used in various fields such as defect inspection, spectroscopy, lithography, and metrology.
The ArF laser has traditionally been the go-to choice for generating high-power 193 nm lasers needed for lithography applications. However, this new achievement with LBO crystal has expanded the potential applications of these lasers. It could lead to improved performance and efficiency in existing DUV applications and enable the development of new technologies that benefit from higher power output. The researchers’ work paves the way for further innovation in the field of DUV lasers.
